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Single layer h-BN (Boron Nitride) film grown in copper foil. h-BN is an insulator with a direct band gap of 5.97 eV. Due to its strong covalent sp2 bonds in the plane, the in-plane mechanical strengt

Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 4 pack Properties of BN film 97% coverage with minor holes and organic residues High Crystalline Quali

Our h-BN crystals reach at most to 2mm in size and are considered as gold standard in 2D materials field. h-BN flakes are produced defect free which is the only commercial h-BN flake used as 2D

An economical solution to h-BN exfoliation. h-BN flakes powders come in large quantities (see images), and can be exfoliated onto arbitrary substrates on multiple occations (+10000 times)

Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.

Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.